Resist material with carbazole diazonium salt acid generator and

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430175, 526320, G03C 160

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active

049853325

ABSTRACT:
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.

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J. V. Crivello, Polymeric Materials Science and Engineering Preprints, vol. 61, Amer. Chem. Soc. Meeting, Fla. 9/11-15/89, pp. 62-66.
Kearns, et al., Journal of Macromolecular Science and Chemistry, Ag(4), 673(1974).

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