Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-04-10
1991-01-15
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430175, 526320, G03C 160
Patent
active
049853325
ABSTRACT:
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt.
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J. V. Crivello, Polymeric Materials Science and Engineering Preprints, vol. 61, Amer. Chem. Soc. Meeting, Fla. 9/11-15/89, pp. 62-66.
Kearns, et al., Journal of Macromolecular Science and Chemistry, Ag(4), 673(1974).
Anderson Albert G.
Chen Yuan Yu G.
Hertler Walter R.
Wheland Robert C.
E. I. Du Pont de Nemours and Company
Michl Paul R.
Young Christopher G.
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