Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-04-10
1992-06-09
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430270, 430188, 522154, G03F 7021, G03F 7023, G03F 7039
Patent
active
051206331
ABSTRACT:
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.
REFERENCES:
patent: 4356252 (1982-10-01), Lee
patent: 4491628 (1985-01-01), Ito et al.
patent: 4985332 (1991-01-01), Anderson et al.
Bauer Richard D.
Chen Gwendyline Y. Y.
Hertler Walter R.
Wheland Robert C.
E. I. Du Pont de Nemours and Company
Hamilton Cynthia
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