Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Patent
1990-04-10
1993-04-27
Schofer, Joseph L.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
526270, 526309, 526320, C08F 2400
Patent
active
052063178
ABSTRACT:
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.
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C. G. Willson, et al., "Resist Mat'ls. for Microelectronics", ChemTech, pp. 102-111 (1989), Willson, et al., pp. 182-189.
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Hertler Walter R.
Sogah Dotsevi Y.
Taylor Gary N.
American Telephone and Telegraph Company
E. I. Du Pont de Nemours and Company
Schofer Joseph L.
Siegell Barbara C.
Smith Jeffrey T.
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