Resist material and process for forming fine resist pattern

Details Resist material and process for forming fine resist pattern Resist material and process for forming fine resist pattern

1982-12-17

1985-09-03

Schofer, Joseph L.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

526245, 428198, 430270, C08F22022, B05D 306

Patent

active

045392501

ABSTRACT:
A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R.sub.1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R.sub.2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R.sub.f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.

REFERENCES:
patent: 2834763 (1958-05-01), Halpern et al.
patent: 3235421 (1966-02-01), Berenbaum et al.
patent: 3637614 (1972-01-01), Greenwood
patent: 4125672 (1978-11-01), Kakuchi et al.
patent: 4147851 (1979-04-01), Raynolds

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