Resist material and pattern formation process

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430270, 430326, 430907, 430909, 430919, 430921, 430923, 430942, 522 28, 522 59, 522 65, 522 68, 626334, 626346, 626347, G03F 7004

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054685893

ABSTRACT:
A resist composition comprising (a) a polymer having at least repeating units of the formulae: ##STR1## (b) a photoacid generator and (c) a solvent, has high sensitivity to light, excellent heat resistance, adhesiveness to a substrate and suitable for pattern formation with high resolution.

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