Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-06-15
1995-11-21
Chu, John S. V.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430270, 430326, 430907, 430909, 430919, 430921, 430923, 430942, 522 28, 522 59, 522 65, 522 68, 626334, 626346, 626347, G03F 7004
Patent
active
054685893
ABSTRACT:
A resist composition comprising (a) a polymer having at least repeating units of the formulae: ##STR1## (b) a photoacid generator and (c) a solvent, has high sensitivity to light, excellent heat resistance, adhesiveness to a substrate and suitable for pattern formation with high resolution.
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Fujie Hirotoshi
Negishi Takaaki
Oono Keiji
Urano Fumiyoshi
Chu John S. V.
Matsushita Electric - Industrial Co., Ltd.
Wako Pure Chemical Industries Ltd.
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