Resist material

Details Resist material Resist material

1995-04-18

1997-05-06

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430170, 4302701, 430326, 430330, 430920, 430923, 430924, 522 33, 522 36, 522 59, G03F 7023, G03F 7004

Patent

active

056270062

ABSTRACT:
A photoresist composition comprising (a) a difficultly alkali-soluble special resin, (b) a photo-sensitive compound capable of generating a carboxylic acid, and (c) a solvent, is effective for pattern formation using deep ultraviolet light, KrF excimer laser beams, etc.

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