Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-03-21
1996-09-24
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430189, 4302701, 430326, 430330, 430909, 522 65, 522 67, 522 68, G03F 7004, G03F 730
Patent
active
055589715
ABSTRACT:
A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.
REFERENCES:
patent: 5332650 (1994-07-01), Murata et al.
patent: 5338641 (1994-08-01), Pawlowski et al.
patent: 5340682 (1994-08-01), Pawlowski et al.
patent: 5350660 (1994-09-01), Urano et al.
Derwent Publications Ltd., Class A89, AN 94-223190 & JP-A 06 161 112 Apr. 7, 1994.
Endo Masayuki
Katsuyama Akiko
Negishi Takaai
Urano Fumiyoshi
Chu John S. Y.
Matsushita Electric - Industrial Co., Ltd.
Wako Pure Chemical Industries Ltd.
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