Resist mask formation process with haloalkyl methacrylate copoly

Details Resist mask formation process with haloalkyl methacrylate copoly Resist mask formation process with haloalkyl methacrylate copoly

1976-10-04

1978-06-20

Smith, Ronald H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 35, 96 362, 427 44, 427 93, 427273, 427336, 427385R, 526292, B05P 306

Patent

active

040962903

ABSTRACT:
A positive relief image is produced by coating a substrate with a layer of a copolymer containing about 90-98 mole percent of polymerized lower alkyl methacrylate units and about 2-10 mole percent of polymerized lower haloalkyl methacrylate units, heating the layer to cause cross-linking between polymer chains by removal of hydrogen halide, patternwise exposing the layer with high energy radiation such as a scanning electron beam, and removing the exposed portion of the layer with a solvent developer.
The purpose of this abstract is to enable the public and the Patents and Trademark Office to rapidly determine the subject matter of the technical disclosure of the application. This abstract is neither intended to define the invention of the application nor is it intended to be limiting as to the scope thereof.

REFERENCES:
patent: 3255163 (1966-06-01), Gobran et al.
patent: 3732190 (1973-05-01), Balle et al.
patent: 3981985 (1976-09-01), Roberts

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