Resist layer application apparatus

Details Resist layer application apparatus Resist layer application apparatus

1992-06-09

1993-12-28

Mitchell, David M.

Dispensing

With conveying conduit jacket and/or inert atmosphere...

B67B 500

Patent

active

052731928

ABSTRACT:
An apparatus for spraying a photo-resist comprises a resist supply reservoir, a pump and a supply line from the pump to a nozzle. Further provided is a standby receptacle into which an end portion of the nozzle is inserted when not being utilized in a spraying operation. The standby receptacle is supplied with N.sub.2 gas, bubbled through a solvent which is held at a bottom portion of the container, surrounded by an air space. The nozzle rests in a nozzle holder so as to be exposed to the internal atmosphere of the container for preventing clogging of the nozzle due to drying of the solvent when the nozzle is not in use.

REFERENCES:
patent: 3018021 (1962-01-01), Gorand et al.
patent: 4285445 (1981-08-01), Vander Molen et al.
patent: 4726494 (1988-02-01), Scott
patent: 4982876 (1991-01-01), Scott

Affiliated with

Also associated with

Rating

Resist layer application apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist layer application apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist layer application apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1537147