Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-04-30
1995-04-04
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 430270, 430326, 430330, 430910, 430945, 522 57, 522 59, 522 65, G03F 7023, G03F 730
Patent
active
054036950
ABSTRACT:
Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.
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J. Photopolym. Sci. Technol., vol. 4. No.3, pp. 389-402, 1991; G. Pawlowski et al Novel Photoacid Generators: Key Components for the Progress of Chemically Amplified . . .
Hayase Rumiko
Hayase Shuzi
Kobayashi Yoshihito
Niki Hirokazu
Onishi Yasunobu
Bowers Jr. Charles L.
Chu John S.
Kabushiki Kaisha Toshiba
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