Resist film coating apparatus

Details Resist film coating apparatus Resist film coating apparatus

1992-05-19

1993-10-05

Jones, W.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Sampling of associated base

118712, 118 52, 118 56, 118320, 427 9, 427 10, B05C 1102, B05C 500

Patent

active

052501167

ABSTRACT:
A resist film coating apparatus comprises a resist receiving plate secured to a rotatable support plate carrying a wafer so as to be disposed along the outer periphery of the wafer, an interference type film thickness meter for measuring the thickness of a resist film spun out to the resist receiving plate, and modifying means for changing the revolution number of the support plate on the basis of a result of measurement by the film thickness meter such that a desired resist film thickness can be obtained.

REFERENCES:
patent: 3689747 (1972-09-01), DiMillia et al.
patent: 3747558 (1973-07-01), Harel
patent: 4702931 (1987-10-01), Falcoff
patent: 4843874 (1989-07-01), Tsuyoshi et al.

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