Resist development control system

Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...

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354317, 134113, 134140, 118 8, G03D 1300

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active

041369408

ABSTRACT:
Apparatus provides an incident light beam which illuminates the surface of a resist coated grooved disc, having an exposure pattern of signal elements formed within the groove, with a light spot that spans a plurality of convolutions of the groove. As the resist coating is developed, portions of the resist coating corresponding to the exposure pattern are removed and the emerging structure of the signal elements serves as a diffraction grating which diffracts the incident light beam. Photodetector apparatus positioned to intercept a selected portion of the diffracted beam provides an output corresponding to the light power in the selected portion. Means responsive to the output of the photodetector are provided for directly indicating the achievement of a desired emerging signal element geometry in the region illuminated by the light spot to thereby control the resist development process.

REFERENCES:
patent: 3663724 (1972-05-01), Benton et al.
patent: 3702277 (1972-11-01), Lerner
patent: 3842194 (1974-10-01), Clemens
patent: 3943302 (1976-03-01), Johnston

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