Resist developing apparatus with selectable spray and drip nozzl

Details Resist developing apparatus with selectable spray and drip nozzl Resist developing apparatus with selectable spray and drip nozzl

1996-02-27

1998-04-14

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396611, 396627, G03D 302

Patent

active

057404887

ABSTRACT:
The present invention provides a resist developing method and apparatus which achieves high in-plane uniformity and high reproducibility of resist pattern accuracy and low consumption of developer. The resist developing method sprays developer on a patterned resist formed on a substrate while rotating the substrate at high speed, drips the developer on the resist while rotating the substrate at low speed, and then, stops the substrate to hold the developer on the surface of the resist. The resist developing apparatus has a rotating substrate holder whose rotation speed is variable, a nozzle for supplying developer onto a substrate, and a device for supplying the developer to the nozzle. The nozzle includes a spray nozzle and a drip nozzle.

REFERENCES:
patent: 4564280 (1986-01-01), Fukuda
patent: 4808513 (1989-02-01), Lazarus et al.
patent: 5342738 (1994-08-01), Ikeda

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