Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Patent
1998-03-11
2000-03-07
Rutledge, D.
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
396627, 118319, 134902, G03D 500
Patent
active
060331348
ABSTRACT:
In the production of semiconductor devices, a pattern-wise exposed resist coating is developed with a developer to form a resist pattern corresponding to the pattern of exposure radiation on an article to be fabricated. The development being carried out with a developer consisting of one or more organic solvents, in at least two stages and in each stage of the development, the development is interrupted when a substantial permeation of the developer of a surface portion of the pattern-forming area of the resist pattern in which the resist pattern remains is completed, and the developed resist coating is dried between this stage and the following development stages. The development of the exposed resist coating is carried out by using a developing apparatus which comprises at least one set of developer-supplying system and rinsing solution-supplying system, and a conveyor means for guiding the article carrying the resist coating.
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Chijimatsu Tatsuo
Kanata Hiroyuki
Kobayashi Koichi
Maruyama Takashi
Yano Keiko
Fujitsu Limited
Rutledge D.
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