Resist compositions

Details Resist compositions Resist compositions

1994-02-16

1995-06-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430169, 430191, 430192, 430193, 525504, 528162, G03F 7023

Patent

active

054222214

ABSTRACT:
In a resist composition, a novolak resin including at least one recurring unit of the formula (1): ##STR1## wherein n is an integer of 1 to 4 and m is an integer of 0 to 3, having a weight average molecular weight of 1,000 to 10,000 calculated as polystyrene, and having the hydrogen atom of a hydroxyl group therein replaced by a 1,2-naphthoquinonediazidosulfonyl group in a proportion of 0.03 to 0.27 mol per hydrogen atom serves as an alkali-soluble resin and a photosensitive agent. The composition is uniform in that the photosensitive agent is uniformly incorporated in the novolak resin, and thus forms a uniform resist film. It is a useful positive resist having improved sensitivity, resolution, heat resistance, and film retentivity.

REFERENCES:
patent: 4477553 (1984-10-01), Yamamoto et al.
patent: 5279918 (1994-01-01), Nishi et al.
Nikkei Microdevices, vol. 4 (1992), pp. 44-46.

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