Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-09-09
1996-08-20
Huff, Mark F.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430313, 430916, 4302701, 522172, G03C 100, G03C 172, G03F 7075
Patent
active
055478085
ABSTRACT:
The present invention provides a composition having sensitivity to light or radiation. The composition comprises a polymer having a siloxane-bond structure which undergoes polymerization reaction when irridiated with light or radiation, and a sensitizing agent. The present invention also provides a process for forming a pattern, preparing a photomask and a semiconductor device by using the composition of the present invention.
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2 Partial translation Examiner's Report in R.O.C. Application No. 80104934 dated May 22, 1992.
Huff Mark F.
Matsushita Electronics Corporation
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