Resist composition containing alkali-soluble resin, 1,2-quinone

Details Resist composition containing alkali-soluble resin, 1,2-quinone Resist composition containing alkali-soluble resin, 1,2-quinone

1991-04-30

1993-03-30

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430342, 430343, 430512, 430519, 430915, 430920, 430922, G03F 7023, G03C 161

Patent

active

051983230

ABSTRACT:
A resist composition comprising an alkali-soluble resin, a 1,2-quinone diazide compound and a compound of the general formula (I): ##STR1## wherein Z is an oxygen or sulfur atom or a group of the formula: >N--R.sub.4 in which R.sub.4 is a hydrogen atom or an alkyl group; R.sub.1, R.sub.2 and R.sub.3 are the same or different and independently a hydrogen atom, a substituted or unsubstituted alkyl group, a halogen atom, a hydroxyl group, a cyano group or a group of the formula: --OCOR" in which R" is a substituted or unsubstituted alkyl group; and X and Y are independently a cyano group or a group of the formula: ##STR2## --COOR or --CONHR' in R is an alkyl group and R' is a hydrogen atom or an aryl group, which is suitable for the formation of very fine patterns on a substrate having a high reflectance.

REFERENCES:
patent: 3916069 (1975-10-01), Tiers et al.
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4617373 (1986-10-01), Pruett et al.
patent: 4749772 (1988-06-01), Weaver et al.
patent: 4927732 (1990-05-01), Merrem et al.
patent: 5043243 (1991-08-01), Yajima et al.

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