Resist composition comprising a siloxane or silsesquioxane polym

Details Resist composition comprising a siloxane or silsesquioxane polym Resist composition comprising a siloxane or silsesquioxane polym

1994-04-08

1995-02-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, G03F 7023, G03F 730

Patent

active

053894928

ABSTRACT:
A resist composition comprising a compound having an active hydrogen and an alkali-soluble siloxane polymer containing in the molecules thereof at least one unit selected from a unit represented by formula (I) and a unit represented by formula (II) ##STR1## wherein the X's are the same or different and each represents one member selected from the group consisting of hydrogen, ##STR2## (where R represents hydrogen, a hydrocarbon group, or a substituted hydrocarbon group); and a carboxyl group;

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Sir Derek Barton and W. David Ollis, "Comprehensive Organic Chemistry: The Synthesis and Reactions of Organic Compounds," vol. 3, Sulphur, Selenium, Silicon, Boron, Organometallic Compounds, pp. 576-577.
W. T. Grubb, "A Rate Study of the Silanol Condensation Reaction at 25.degree. in Alcoholic Solvents," Jan. 16, 1954, vol. 76, pp. 3408-3409.

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