Resist composition comprising a quinone diazide sulfonic diester

Details Resist composition comprising a quinone diazide sulfonic diester Resist composition comprising a quinone diazide sulfonic diester

1993-11-16

1995-01-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, G03F 7023, G03F 730

Patent

active

053785860

ABSTRACT:
A positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, first and second quinone diazide sulfonic acid esters of a phenol compound, wherein

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