Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-11-10
1997-11-18
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430170, 430191, 430192, 4302701, G03F 7021, G03F 7023
Patent
active
056886284
ABSTRACT:
A resist composition comprising in admixture (A) a compound which forms an acid upon exposure to active rays, (B) a polymer which has at least one structural unit with a group unstable to an acid and cleaves at this group in the presence of the acid derived from the compound (A) to turn alkali-soluble, and (C) a phenolic compound, and a process for forming a resist pattern using this resist composition are provided.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 5350660 (1994-09-01), Urano et al.
Abe Nobunori
Miyata Shuichi
Oie Masayuki
Oikawa Akira
Tanaka Hideyuki
Nippon Zeon Co. Ltd.
Young Christopher G.
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