Resist coating method and resist coating apparatus

Details Resist coating method and resist coating apparatus Resist coating method and resist coating apparatus

2006-10-16

2010-10-26

Jolley, Kirsten C (Department: 1715)

Coating processes

Centrifugal force utilized

C427S425000, C118S052000, C118S320000, C438S758000

Reexamination Certificate

active

07820243

ABSTRACT:
A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then decelerates the rotation of the substrate to a second rotational speed lower than the first rotational speed, or until rotational halt, makes the deceleration smaller in the deceleration step as the rotational speed becomes closer to the second rotational speed or the rotational halt, and accelerates the rotation of the substrate to a third rotational speed higher than the second rotational speed to spin off a residue of the resist solution.

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patent: 6117486 (2000-09-01), Yoshihara
patent: 2004/0076749 (2004-04-01), Lee et al.
patent: 10-151406 (1998-06-01), None
patent: 11-16810 (1999-01-01), None
patent: 11-260717 (1999-09-01), None
patent: 3330324 (2002-07-01), None

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