Resist coating method and resist coating apparatus

Details Resist coating method and resist coating apparatus Resist coating method and resist coating apparatus

2011-03-15

2011-03-15

Jolley, Kirsten C (Department: 1715)

Coating processes

Centrifugal force utilized

C427S425000, C118S052000, C118S320000, C438S758000

Reexamination Certificate

active

07906173

ABSTRACT:
A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then reduces a rotational speed of the target substrate to a second rotational speed lower than the first rotational speed, reduces the rotational speed of the target substrate to a third rotational speed lower than the second rotational speed or until rotational halt to adjust the film thickness of the resist solution, and accelerates the rotation of the target substrate to a fourth rotational speed higher than the third rotational speed to spin off a residue of the resist solution.

REFERENCES:
patent: 6117486 (2000-09-01), Yoshihara
patent: 2004/0076749 (2004-04-01), Lee et al.
patent: 10-151406 (1998-06-01), None
patent: 11-16810 (1999-01-01), None
patent: 11-260717 (1999-09-01), None
patent: 3330324 (2002-07-01), None

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