Resist coating-developing system

Details Resist coating-developing system Resist coating-developing system

1999-02-03

2000-10-03

Mathews, Alan A.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396627, 414935, 414937, G03D 500, B65G 4907

Patent

active

061263389

ABSTRACT:
A resist coating-developing system includes two transporting devices each for transporting a substrate, a relay section arranged between the two transporting devices for temporarily retaining a substrate thereon, a coating unit to and from which a substrate is transferred by one of the two transporting devices, the coating unit subjecting the substrate transferred thereto to a resist coating process, and a developing unit to and from which a substrate is transferred by the other of the two transporting devices, the developing unit subjecting an exposed resist of the substrate transferred thereto to a developing process, wherein the coating unit and the developing unit are arranged opposite to each other with the two transporting devices and the relay section interposed therebetween.

REFERENCES:
patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5339128 (1994-08-01), Tateyama et al.
patent: 5639301 (1997-06-01), Sasada et al.
patent: 5664254 (1997-09-01), Ohkura et al.
patent: 5844662 (1998-12-01), Akimoto et al.

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