Resist coating apparatus

Details Resist coating apparatus Resist coating apparatus

1988-03-24

1989-01-31

McIntosh, John

Coating apparatus

With means to centrifuge work

118320, B05C 1300, B05C 1500

Patent

active

048008362

ABSTRACT:
A liquid state resist is dropped to form a coating on a semiconductor substrate mounted on a rotary chuck disposed in a resist coating vessel in which a sealed solvent vapor atmosphere is created. An adjusting plate is provided in the coating vessel above the rotary chuck in a stationary or movable manner to weaken or substantially reduce a swirly flow of the solvent vapor which tends to occur in the coating vessel when the chuck is rotated. Thus a substrate coated with a resist film of uniform thickness is obtained.

REFERENCES:
patent: 4510176 (1985-04-01), Cuthbert et al.

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