Resin suitable for an acid generator

Details Resin suitable for an acid generator Resin suitable for an acid generator

2011-04-26

2011-04-26

Wu, David (Department: 1762)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C430S270100, C524S544000, C526S287000

Reexamination Certificate

active

07932334

ABSTRACT:
The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

REFERENCES:
patent: 6908722 (2005-06-01), Ebata et al.
patent: 2006/0042949 (2006-03-01), McCollum et al.
patent: 2002-091002 (2002-03-01), None
Ito, Hiroshi, Journal of Photopolymer Science and Technology, vol. 11, No. 3, pp. 379-394, (1998).
Stewart et al., Journal of Vacuum Science Technology B, vol. 20, No. 6, pp. 2946-2952, Nov./Dec. 2002.
Wu et al., Advanced Materials, vol. 13, No. 9, pp. 670-672, (May 3, 2001).

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