Resin compositions and process for forming transparent thin film

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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525486, C08L 6304

Patent

active

051807947

DESCRIPTION:

BRIEF SUMMARY
TECHNICAL FIELD

The present invention relates to resin compositions and a process for forming transparent thin films. The invention is particularly useful for forming a protective film or a smooth layer on a colored resin film formed on the surface of a glass substrate or the like.


BACKGROUND ART

Generally, an epoxy resin has been used as base material and a phenol novolak or cresol novolak has been employed as curing agent for forming a protective film or smooth layer on a colored resin film formed on the surface of a glass plate or the like. Combination of such base material and curing agent, however, was usually poor in leveling qualities and tended to form pinholes or unevenness in the produced protective film or smooth layer.
In the course of studies on protective film or smooth layer for colored resin film, especially the one for color filter for liquid crystal displays, the present inventors found previously that a thin film with excellent leveling qualities and free of pinholes could be obtained from a phenol novolak and/or cresol novolak and an amino silane-modified product of glycidyl ether of phenol novolak and/or cresol novolak by dissolving them in an organic solvent, coating the solution on a substrate such as a glass plate, then drying and curing the coat (Japanese Patent Application Laid-Open (KOKAI) No. 63-77921 (1988)).
For obtaining the aminosilane-modified product, however, it is necessary to carry out the reaction at a high temperature ranging from 60.degree. to 140.degree. C., and also the aminosilicon used as modifier must be reacted almost 100%. Insufficient reaction results in the formation of fine silicon particles in he reaction system, and such fine silicon particles cause scattering of transmitted light to impair the function of color filter for liquid crystal displays.


DISCLOSURE OF THE INVENTION

As a result of further studies for solving these problems, the present inventors found that in the process for obtaining a transparent thin film by dissolving a phenol novolak and/or cresol novolak and a glycidyl ether of phenol novolak and/or cresol novolak in an organic solvent, coating the resultant solution on a substrate, then drying and heat curing the coating, when a silane coupling agent having an aromatic ring and an amino group having active hydrogen in the same molecule is used as an additive, it is possible to obtain a transparent thin film having excellent leveling qualities and high smoothness without forming fine silicon particles and without requiring a reaction for aminosilane modification.
Thus, the present invention relates to a resin composition comprising: having active hydrogen in the same molecule.
The present invention also relates to a process for forming a transparent thin film which comprises dissolving a glycidyl ether of phenol novolak and/or cresol novolak (hereinafter represented as epoxy resin) and a phenol novolak and/or cresol novolak (hereinafter represented as novolak) in an organic solvent, forming a coating from the solution and heat curing the coating, wherein the improvement comprises the use of a silane coupling agent having an aromatic ring and an amino group having active hydrogen in the same molecule as an additive.
The present invention further relates to transparent thin films obtained by the above-described method.
The epoxy resin used in the present invention is preferably then one having an average molecular weight of 300 to 8,000.
The novolak used in this invention is preferably of an average molecule weight ranging from 300 to 8,000.
The silane coupling agent used in the present invention is the one containing an aromatic ring and an amino group having active hydrogen in the same molecule. The aromatic ring has an ability to improve the solubility of silane coupling agent in the solvent, such as ethyl cellosolve acetate, isopropyl cellosolve acetate, etc., which is used for dissolving the novolak and epoxy resin. The amino group having active hydrogen is reacted with epoxy group in the course of drying or curing of the coat to

REFERENCES:
patent: 4312902 (1982-01-01), Murase et al.
patent: 4328150 (1982-05-01), Kondow et al.
patent: 4374879 (1983-02-01), Roberts et al.
patent: 4639476 (1987-01-01), Tajiri et al.
patent: 4695598 (1987-09-01), Yamamoto et al.
patent: 4904721 (1990-02-01), Hanaoka et al.
patent: 4920164 (1990-04-01), Sasaki et al.
patent: 5079313 (1992-01-01), Okuno et al.
"Handbook of Epoxy Resins", Lee and Neville, Mar. 1967, pp. 11-14, 11-15, 24-28, 24-29, 24-30, 24-31, 32, 33.

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