Resin blends for improved vesicular systems

Details Resin blends for improved vesicular systems Resin blends for improved vesicular systems

1979-11-06

1981-06-09

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430152, 430157, 430176, 430192, 430197, 430271, 430290, 430534, 430535, G03C 160, G03C 176, G03C 172

Patent

active

042726034

ABSTRACT:
A vesicular photographic material comprising a polymeric matrix containing a sensitizer which liberates gas when exposed to light, and a process for manufacture of said material. The polymeric matrix comprises a blend of polymethacrylonitrile homopolymer with another resin selected from the group consisting of vinyl polymers and copolymers; epoxy polymers; and copolymers with polyurethane segments. Improved photometrics, particularly film speed, are realized.

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