Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Reexamination Certificate
2006-10-03
2006-10-03
Edwards, Laura (Department: 1734)
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
C118S503000, C118S504000, C118S505000
Reexamination Certificate
active
07115169
ABSTRACT:
A replaceable shielding apparatus provides a cost effective way of shielding a portion of a workpiece during processing. The apparatus includes a replaceable shield, made of comparable weight as the workpiece for allowing replacement of the shield in the same way as the replacement of the workpiece. With this feature, the replacement of the shield is a routine process and would not interfere much with the workpiece operation. The invention further includes a shield clamp for clamping the shield onto the workpiece. In a preferred embodiment, the invention further includes a non-reactive gas inlet for creating a pressurized cavity in the vicinity of the shielded portion of the workpiece.
REFERENCES:
patent: 3514391 (1970-05-01), Hablanian et al.
patent: 4033287 (1977-07-01), Alexander, Jr. et al.
patent: 4932358 (1990-06-01), Studley et al.
patent: 4978412 (1990-12-01), Aoki et al.
patent: 5277751 (1994-01-01), Ogle
patent: 5304248 (1994-04-01), Cheng et al.
patent: 5417798 (1995-05-01), Nishibayashi et al.
patent: 5445709 (1995-08-01), Kojima et al.
patent: 5503725 (1996-04-01), Sablev et al.
patent: 5632873 (1997-05-01), Stevens et al.
patent: 5711815 (1998-01-01), Lee et al.
patent: 5740009 (1998-04-01), Pu et al.
patent: 5766363 (1998-06-01), Mizuno et al.
patent: 5800619 (1998-09-01), Holland et al.
patent: 5804046 (1998-09-01), Sawada et al.
patent: 5814154 (1998-09-01), Boitnott et al.
patent: 5837057 (1998-11-01), Koyama et al.
patent: 5846331 (1998-12-01), Miyamoto
patent: 5851299 (1998-12-01), Cheng et al.
patent: 5874704 (1999-02-01), Gates
patent: 5922223 (1999-07-01), Okumura et al.
patent: 5925226 (1999-07-01), Hurwitt et al.
patent: 5968275 (1999-10-01), Lee et al.
patent: 5993594 (1999-11-01), Wicker et al.
patent: 5997651 (1999-12-01), Matsuse et al.
patent: 6006694 (1999-12-01), DeOrnellas et al.
patent: 6026764 (2000-02-01), Hwang
patent: 6046425 (2000-04-01), Kaji et al.
patent: 6050217 (2000-04-01), Li
patent: 6059922 (2000-05-01), Yamazaki et al.
patent: 6067930 (2000-05-01), Minato et al.
patent: 6170431 (2001-01-01), DeOrnellas et al.
patent: 6173674 (2001-01-01), DeOrnellas et al.
patent: 6440219 (2002-08-01), Nguyen
patent: 6641672 (2003-11-01), Nguyen
Reinberg,Plasma Etch Equipment Technology, M. Triodes, Perkin-Elmer Corporation, Norwalk, CT, 1989 by Academic Press, Inc. ISBN 0-12-469370-9; pp. 350-351.
Plasma Etching Technology, Feb. 10-11, 1997, Burlingame, CA, Continuing Education in Engineering. University Extension. U. of California, Berkeley,Plasma Etching Technology, An Overview, D.L. Flamm, D.L. Flamm 1992-1996, title95011501v2, D.L. Flamm 1995, src5012608, 3 pgs.
Edwards Laura
Fliesler & Meyer LLP
Tegal Corporation
LandOfFree
Replaceable shielding apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Replaceable shielding apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Replaceable shielding apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3674119