Repetitively pumped electron beam device

Electric lamp and discharge devices: systems – Discharge device load – Discharge control discharge device load

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315339, 328227, 328233, 331 945PE, H01S 309

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active

041624327

ABSTRACT:
Apparatus for producing fast, repetitive pulses of controllable length of an electron beam by phased energy storage in a transmission line of length matched to the number of pulses and specific pulse lengths desired.

REFERENCES:
patent: 3828274 (1974-08-01), Krawetz
patent: 3925670 (1975-12-01), Farrell et al.
patent: 3956711 (1976-05-01), Waynant
patent: 3972009 (1976-07-01), Duchet
patent: 4041415 (1977-08-01), Ault et al.
patent: 4047125 (1977-09-01), Dreyfus
Loda et al., Repetitively Pulsed Electron Beam Generator, Electron Beam Technology Symposium, Sandia Corp. (Albuquerque, N.M., Nov. 1-3, 1975).
Akimov, et al. Generation of Controllable Light Pulses in an Electron-Beam-Pumped Laser, Soviet Journal of Quantum Electronics, vol. 1, 1972, pp. 649-651.
Yamamoto, et al. Nanosecond Pulsed Electron Source with Double Pulse Control, Review of Scientific Instruments, vol. 45, 1974, pp. 591-592.
Bagaev, et al. Electron-Beam-Controlled Carbon Dioxide Laser Operating under Pulse Repetition Conditions, Soviet Journal of Quantum Electronics, vol. 4, 1974, pp. 777-779.
Ault, Table-Top Ar-N.sub.2 Laser, Applied Physics Letters, vol. 26, 1975, pp. 619-620.

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