Wells – Processes – Separate steps of fracturing or attacking formation
Patent
1988-02-01
1989-05-23
Suchfield, George A.
Wells
Processes
Separate steps of fracturing or attacking formation
166300, 166308, 252 8551, E21B 4326
Patent
active
048321230
ABSTRACT:
A method for increasing the efficiency by which fracture fluids are produced back from a hydrocarbonaceous fluid bearing formation. To remove said fracture fluid, a chemical blowing agent is placed into the formation. After placement of said blowing agent and fracturing the formation, the blowing agent decomposes thereby either causing the filter cake to become more porous or providing a driving force for fluid load removal from the matrix. Increased porosity enhances communication between the formation and the fracture, thus increasing the efficiency of fracture fluid production. Gas liberation within the matrix establishes communication pathways for subsequent removal of hydrocarbonaceous fluids by displacing fluid loads into the fracture and the well.
REFERENCES:
patent: 2943681 (1960-07-01), Barrett
patent: 3529666 (1970-09-01), Crowe
patent: 3818990 (1974-06-01), Coulter
patent: 4008769 (1977-02-01), Chang
patent: 4219083 (1980-08-01), Richardson et al.
patent: 4232741 (1980-11-01), Richardson et al.
patent: 4450010 (1984-05-01), Burkhalter et al.
patent: 4464268 (1984-08-01), Schievelbein
patent: 4609475 (1986-09-01), Hanlon et al.
patent: 4610795 (1986-09-01), Norris et al.
patent: 4705810 (1987-11-01), Millet et al.
Abou-Sayed Ibrahim S.
Hazlett Randy D.
Malone Charles A.
McKillop Alexander J.
Mobil Oil Corp.
Speciale Charles J.
Suchfield George A.
LandOfFree
Removing fracture fluid via chemical blowing agents does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Removing fracture fluid via chemical blowing agents, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Removing fracture fluid via chemical blowing agents will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1723845