Remover solution for resist

Compositions – Water-softening or purifying or scale-inhibiting agents

Patent

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Details

252170, 134 38, C09D 900

Patent

active

049448935

ABSTRACT:
The remover composition of the invention is advantageous in respect of the thermal stability without precipitation of insoluble matters when the remover is used prolongedly in a removing work of patterned resist, e.g., photoresist, layer in the manufacturing process of semiconductor devices. The inventive remover composition characteristically contains 1 to 50,000 ppm by weight of an acetylene alcohol such as 3-methyl-2-butyn-3-ol added to an organic remover solution composed of an alkylbenzene sulfonic acid, phenol compound, halogenated hydrocarbon compound and/or aromatic hydrocarbon compound.

REFERENCES:
patent: 3988256 (1976-10-01), Vandermey et al.

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