Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1998-06-03
1999-05-18
Kopec, Mark
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510255, 510258, 510264, 510269, 510401, 510402, 134 13, 134 2, 134 3, 134 40, 134 42, C11D7/08;7/22;7/50
Patent
active
059050632
ABSTRACT:
A remover solution composition for resist which comprises (a) a salt of hydrofluoric acid with a metal-free base, (b) a water-soluble organic solvent, and (c) water and optionally (d) an anticorrosive, and has a pH or 5 to 8. A method for removing resist which comprises the steps of (I) forming a resist layer on a substrate having a metal film, (II) light-exposing the resist layer through a mask pattern and subsequently developing the resist layer to form a resist pattern, and (III) dry-etching the substrate using the resist pattern as a mask and then removing the unnecessary resist and modified resist film with the remover solution composition.
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Derwent Publications Ltd., London, GB; Class G06, AN 96-416309 XP002024480 & JP 08 202 052 A (Tokyo Ohka Kogyo Co Ltd), Aug. 9, 1996, Abstract.
Kobayashi Masakazu
Nakayama Toshimasa
Tanabe Masahito
Wakiya Kazumasa
Delcotto Gregory R.
Kopec Mark
Tokyo Ohka Kogyo Co. Ltd.
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