Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1996-11-13
1998-08-11
Lieberman, Paul
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 2, 134 3, 134 40, 134 42, 510176, 510255, 510258, 510264, 510269, 510401, 510402, B08B 304, B08B 308, C11D 710, C11D 750
Patent
active
057922748
ABSTRACT:
A remover solution composition for resist which comprises (a) a salt of hydrofluoric acid with a metal-free base, (b) a water-soluble organic solvent, and (c) water and optionally (d) an anticorrosive, and has a pH of 5 to 8. A method for removing resist which comprises the steps of (I) forming a resist layer on a substrate having a metal film, (II) light-exposing the resist layer through a mask pattern and subsequently developing the resist layer to form a resist pattern, and (III) dry-etching the substrate using the resist pattern as a mask and then removing the unnecessary resist and modified resist film with the remover solution composition.
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Derwent Publications Ltd., London, GB; AN 96-416309 XP002024480 & JP 08 202 052 A (Tokyo Ohka Kogyo Co Ltd), 9 Aug. 1996, Abstract.
Kobayashi Masakazu
Nakayama Toshimasa
Tanabe Masahito
Wakiya Kazumasa
Delcotto Gregory R.
Lieberman Paul
Tokyo Ohka Kogyo Co. Ltd.
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