Remover compositions

Details Remover compositions Remover compositions

2011-08-30

2011-08-30

Carrillo, Sharidan (Department: 1711)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S002000, C134S003000, C134S026000, C134S027000, C134S028000, C134S029000, C134S030000, C134S034000, C134S036000, C134S041000, C134S042000, C134S902000, C510S175000, C510S469000, C510S489000

Reexamination Certificate

active

08007593

ABSTRACT:
A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1, 1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from 0.2 to 30% by weight, the component (b) in an amount of from 0.05 to 10% by weight, and the water in an amount of from 60 to 99.75% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13; and a remover composition containing an organic amine (A), an organic phosphonic acid (B), a linear sugar alcohol (C) and water, wherein the remover composition contains the component (A) in an amount of from 0.2 to 30% by weight, the component (B) in an amount of from 0.05 to 10% by weight, the component (C) in an amount of from 0.1 to 10% by weight, and the water in an amount of from 50 to 99.65% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13.

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Machine Translation of JP 2005-165263A.
English language abstract of JP 2004-094203 (Mar. 25, 2004).
English language abstract of JP 2001-168015 (Jun. 22, 2001).
English language abstract of JP 2004-004775 (2004-01-08).
Japanese Office Action issued Jun. 22, 2010, in Japanese Application No. 2005-211911, with translation.
Office Action mailed Apr. 7, 2010 in Chinese Application No. 200680025743.8

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