Removal of tritium and tritium-containing compounds from a gaseo

Details Removal of tritium and tritium-containing compounds from a gaseo Removal of tritium and tritium-containing compounds from a gaseo

1973-08-27

1979-12-11

Thomas, Earl C.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Hydrogen component

423580, 423648A, 2523011W, B01D 5334

Patent

active

041783506

ABSTRACT:
Tritiated species, e.g., tritium, tritiated water, and/or tritiated hydrocarbons, are removed from gas streams comprised thereof by reacting the same over a precious metal catalyst with sufficient air or oxygen to insure conversion of all tritiated species to tritiated water and, if hydrocarbons are present in the gaseous feedstock, carbon dioxide. The tritiated water and any other moisture that might be present in the reaction effluent are next adsorbed by a desiccant dryer, preferably to a level of less than one part per million. Most desirably, the desiccant dryer effluent is then diluted with non-radioactive water such that the tritiated water is diluted by a factor of at least about 1,000 to 1; the resulting water mixture can be adsorbed from the diluted effluent by a second dessicant dryer to provide a value in the ultimate effluent gas of less than about one-half parts per billion tritiated water.

REFERENCES:
patent: 3360484 (1967-12-01), Laurent
patent: 3679366 (1972-07-01), Benson et al.
Gaven et al.: Catalytic Recombination of Hydrogen and Oxygen-II, United States Atomic Energy Commission, Aug. 29, 1952, pp. 1-34.

Affiliated with

Also associated with

Rating

Removal of tritium and tritium-containing compounds from a gaseo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Removal of tritium and tritium-containing compounds from a gaseo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Removal of tritium and tritium-containing compounds from a gaseo will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-310740