Removal of technetium impurities from uranium hexafluoride

Details Removal of technetium impurities from uranium hexafluoride Removal of technetium impurities from uranium hexafluoride

1997-05-21

1998-10-20

Nguyen, Ngoc-Yen

Chemistry of inorganic compounds

Radioactive

Uranium compound

423 3, C01G 4306

Patent

active

058261630

ABSTRACT:
Processes for the removal of technetium from contaminated uranium hexafluoride containing technetium, typically as technetium-99 (.sup.99 Tc) in nominal chemical forms are provided. The processes involve contacting the contaminated liquefied uranium hexafluoride with a metal fluoride, typically magnesium fluoride (MgF.sub.2), for a period of time sufficient for the technetium to become adsorbed onto the metal fluoride thereby producing a purified uranium hexafluoride liquid; and removing the purified uranium hexafluoride liquid from the metal fluoride having adsorbed technetium.

REFERENCES:
patent: 3806576 (1974-04-01), Carles et al.
patent: 3848048 (1974-11-01), Moore
patent: 5613186 (1997-03-01), Larson et al.
Milford, "Engineering Design of Oak Ridge Fluoride Volatility Pilot Plant" Ind. & Eng. Chem., vol. 50, No. 2, pp. 187-191, Feb. 1958.
Smiley et al, "Removal of Impurities from Uranium Hexafluoride by Selective Sorption Techniques", Trans. of Am. Nucl. Soc., vol. 10, No. 2, p. 507, Nov. 1967.

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