Metal working – Barrier layer or semiconductor device making
Patent
1990-11-09
1992-03-31
Chaudhuri, Olik
Metal working
Barrier layer or semiconductor device making
2504921, 2504922, 2504923, H01L 21268
Patent
active
050995570
ABSTRACT:
A method and apparatus for removing surface contaminants from the surface of a substrate by high-energy irradiation is provided. The invention enables removal of surface contaminants without altering of the substrate's underlying molecular structure. The source of high-energy irradiation may comprise a pulsed laser.
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Chaudhuri Olik
Ojan Ourmazd S.
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