Removal of surface contaminants by irradiation from a high energ

Details Removal of surface contaminants by irradiation from a high energ Removal of surface contaminants by irradiation from a high energ

1994-09-15

1996-07-02

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

21912168, 2191216, 134 1, B08B 700

Patent

active

055318576

ABSTRACT:
An apparatus for removing surface contaminants from a planar or irregularly shaped surface of a substrate by high-energy irradiation is provided. The invention enables removal of surface contaminants without altering the underlying molecular crystal structure of the substrate. The source of high-energy irradiation includes a pulsed or continuous wave laser or high-energy lamp.

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