Fishing – trapping – and vermin destroying
Patent
1988-07-08
1991-06-18
Chaudhuri, Olik
Fishing, trapping, and vermin destroying
437 19, 437907, 437908, 437939, 437942, 437946, 148DIG17, 148DIG91, 148DIG93, 134 1, H01L 21268
Patent
active
050249681
ABSTRACT:
A method and apparatus for removing surface contaminants from the surface of a substrate by high-energy irradiation is provided. The invention enables removal of surface contaminants without altering of the substrate's underlying molecular structure. The source of high-energy irradiation may comprise a pulsed laser.
REFERENCES:
patent: 3364087 (1968-01-01), Solomon et al.
patent: 3464534 (1969-09-01), Muncheryan
patent: 3503804 (1970-03-01), Schneider
patent: 4181538 (1980-01-01), Narayan et al.
patent: 4292093 (1981-09-01), Ownby et al.
patent: 4305973 (1981-12-01), Yaron et al.
patent: 4668304 (1987-05-01), Schachameyer et al.
patent: 4680616 (1987-07-01), Delahoy et al.
patent: 4731516 (1988-03-01), Noguchi et al.
patent: 4782029 (1988-11-01), Takemura et al.
Zehner et al., "Silicon Surface Structure and Surface Impurities after Pulsed Laser Annealing", Laser and Electron Beam Processing of Materials, C. W. White and P. S. Peercy, eds., Academic Press, Inc., 1980, pp. 201-207.
Zehner et al., "Surface Studies of Laser Annealed Semiconductors", Laser-Solid Interactions and Transient Thermal Processing of Materials, Narayan, Brown, and Lemons, eds., Elsevier Science Publishing, Co., Inc., 1983, pp. 317-328.
Bedair et al., Atomically Clean Surfaces by Pulsed Laser Bombardment, 1969.
Lazzarini, et al., Lasers for the Cleaning of Statuary: Initial Results and Potentialities, 1973.
Bermudez, Changes in Surface Composition of Si, TiO.sub.2, SiO.sub.2 Induced by Pulsed Ruby-Laser Irradiation, 1-82.
Jellison et al., Time-Resolved Ellipsometry, 9-1-85.
Zehner et al., Preparation of Atomically Clean Silicon Surfaces by Pulsed Laser Irradiation, 1-1-80.
McKinley et al., Atomically Clean Semiconductor Surfaces Prepared by Laser Irradiation, 1980.
Chaudhuri Olik
Wilczewski M.
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