Removal of sulfur dioxide from gas streams

Details Removal of sulfur dioxide from gas streams Removal of sulfur dioxide from gas streams

1991-12-20

1993-04-13

Heller, Gregory A.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Sulfur or sulfur containing component

42324308, C01B 1700

Patent

active

052021033

ABSTRACT:
Processes are provided for the removal of sulfur dioxide from gas streams using aqueous lime or limestone slurries containing an additive comprising an amine. The amines have an available alkalinity of at least 0.5 meq/gram at a pH between 3.0 and 5.5. The amines are highly soluble in the slurry and can have a low volatility, thereby reducing amine losses with the gas product. Furthermore, amines which are absorbed on the calcium sulfate or calcium sulfite by-products can be recovered by water-washing with a water make-up stream.

REFERENCES:
patent: 3632306 (1972-01-01), Villiers-Fisher et al.
patent: 3637345 (1972-01-01), Leder
patent: 3873673 (1975-03-01), Teague et al.
patent: 3883639 (1975-05-01), Cronkright, Jr. et al.
patent: 4388281 (1983-06-01), Holter et al.
patent: 4409192 (1983-10-01), Lichtner et al.
patent: 4423018 (1983-12-01), Lester, Jr. et al.
patent: 4612175 (1986-09-01), Harkness et al.
Y. Josephe Lee et al., Oxidative Degradation of Organic Acids Conjugated with Sulfite Oxidation in Flue Gas Desulfurization. EPA/600/S2.88/018, Apr. 1988.
Gary T. Rochelle et al., The Effect of Additives on Mass Transfer in CaCO.sub.3 or CaO Slurry Scrubbing of SO from Wast Gases. Ind. Eng. Chem. Fundam. vol. 16, No. 1, 1977.

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