Removal of silane from gas streams

Details Removal of silane from gas streams Removal of silane from gas streams

1998-12-17

2000-07-11

Griffin, Steven P.

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

423210, 423341, C01B 3308

Patent

active

060868384

ABSTRACT:
Silane is removed from the exhaust gas of silicon CVD reactors by injecting a stoichiometric excess of halogen to produce halosilanes which are hydrolyzed in water. The removal method permits the use of small individual reactors at each CVD reactor site and eliminates the collection and transport of hazardous gases to a central disposal site for destruction.

REFERENCES:
patent: 4252780 (1981-02-01), Koppl et al.

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