Removal of residual monomer in the presence of water by dielectr

Details Removal of residual monomer in the presence of water by dielectr Removal of residual monomer in the presence of water by dielectr

1975-12-11

1977-04-26

Levin, Stanford M.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Treating polymer containing material or treating a solid...

528490, 528491, 528492, C08F 600

Patent

active

040202674

ABSTRACT:
Residual vinyl halide is removed from vinyl halide polymer by radiofrequency dielectric heating while maintaining the presence of water in the polymer by impeding evaporation of water from the polymer.

REFERENCES:
patent: 3652752 (1972-03-01), Rosenthal
patent: 3771234 (1973-11-01), Forster et al.

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