Removal of projections on epitaxial layers

Adhesive bonding and miscellaneous chemical manufacture – Methods

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29580, 29583, 156 6, 156 17, H01L 21304

Patent

active

039909255

ABSTRACT:
A method for removing projections from the surface of epitaxially-deposited semiconductor layers is described. These projections can adversely affect the results of photolithographic processing. The method comprises forming an oxide layer on the surface and mechanically fracturing the oxide-coated projections. In the ensuing step anisotropic semiconductor etchants are applied to the surface to remove the projections selectively.

REFERENCES:
patent: 3699644 (1972-10-01), Cocca
patent: 3718514 (1973-02-01), Erdman et al.
patent: 3738881 (1973-06-01), Erdman et al.
patent: 3783044 (1974-01-01), Cheskis et al.
patent: 3838501 (1974-10-01), Umbaugh et al.

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