Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent
1980-06-16
1982-03-02
Thomas, Earl C.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
423481, 423488, 423490, B01D 5334
Patent
active
043178057
ABSTRACT:
A method of removing hydrogen fluoride from gaseous mixtures of hydrogen fluoride and hydrogen chloride, which contain up to about 5 percent by weight of hydrogen fluoride, is described. The method comprises initially contacting the gaseous mixture with a particulate, substantially anhydrous, bed of alkaline earth metal chloride material, for example, calcium chloride, to produce an effluent gas mixture having a substantially reduced hydrogen fluoride content. The effluent gas is then contacted with a secondary treatment bed of particulate, substantially anhydrous, alkaline earth metal chloride material, for example, calcium chloride, to produce a product gas containing less than 20 ppm of hydrogen fluoride. The temperature of the secondary treatment bed is maintained in the range from about -20.degree. to about +20.degree. C., and, more preferably, in the range from about 0.degree. to about 5.degree. C. The temperature of the secondary treatment bed may be controlled by control of the amount of hydrogen fluoride in the gas mixture entering the secondary treatment bed and by the use of an intervening gas cooling step.
REFERENCES:
patent: 3140916 (1964-07-01), Lowdermilk
patent: 3976447 (1976-08-01), Merchant et al.
patent: 4009214 (1977-02-01), Sze et al.
patent: 4128626 (1978-12-01), Merchant
Poulenc, "Annales de Chimie et de Physique", vol. 2, Series 7, 1894, pp. 24 and 26.
Slesser et al., "Preparation, Properties and Technology of Fluorine and Organic Fluoro Compounds", McGraw-Hill Book Co., New York, 1st Ed., 1951, pp. 66 and 67.
Turnbull et al., Analysis and Disposal of Fluorine", Industrial and Engineering Chemistry, vol. 39, No. 3, pp. 286, 288.
Baxamusa Yusuf A.
Robota Stephen
Cookfair Arthur S.
Crossetta, Jr. William J.
Hooker Chemicals & Plastics Corp.
Thomas Earl C.
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