Removal of acidic impurity from chlorofluoromethanes

Details Removal of acidic impurity from chlorofluoromethanes Removal of acidic impurity from chlorofluoromethanes

1977-08-22

1978-07-25

Thomas, Earl C.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Halogenous component

260652P, B01D 5334

Patent

active

041029810

ABSTRACT:
Acidic impurity, such as HCl, is removed from chlorofluoromethanes of the formula CHCl.sub.n F.sub.3-n, where n is 1 or 2, by scrubbing the contaminated fluorocarbon with an aqueous solution made from a mixture of trisodium phosphate and sodium hydroxide. Use of this solution as scrubbing medium allows purification of the contaminated fluorocarbon without appreciable decomposition and also without generation of a significant quantity of environmentally objectionable waste stream of high phosphate content. The presence of NaOH in the scrubbing medium provides in situ regeneration of mono and disodium phosphates to trisodium phosphate.

REFERENCES:
patent: 2443630 (1948-06-01), McBee et al.
patent: 2470088 (1949-05-01), Benning et al.

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