Etching a substrate: processes – Nongaseous phase etching of substrate – Relative movement between the substrate and a confined pool...
Patent
1993-09-03
1995-06-20
Dang, Thi
Etching a substrate: processes
Nongaseous phase etching of substrate
Relative movement between the substrate and a confined pool...
252 795, 216 97, 216 99, B22F 300, B28B 300
Patent
active
054258472
ABSTRACT:
Method of removing a layer of glass formed on a sintered body which is manufactured by hot isostatic pressing of a preformed body of inorganic powder in a pressure medium at a sintering temperature, wherein the sintered body of inorganic powder is retained in an alkali solution of at least 2 percent by weight at a temperature not less than 100.degree. C. for not less than one hour.
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Narukawa Akira
Watanabe Mitsuyoshi
Dang Thi
NGK Insulators Ltd.
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