Removable bandpass filter for microlithographic aligners

Details Removable bandpass filter for microlithographic aligners Removable bandpass filter for microlithographic aligners

1992-08-05

1994-12-13

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 356416, G03F 900

Patent

active

053729013

ABSTRACT:
A removable bandpass filter layer (22), which is preferably part of a pattern transfer tool (10), improves the resolution of a semiconductor wafer aligner that uses a relatively broad bandwidth radiation source. A narrower bandwidth filter layer provides more complete destructive interference of undesirable diffraction patterns when it is used with a phase-shift pattern transfer tool and removes radiation of longer wavelengths to improve resolution when it is used with a nonphase-shift pattern transfer tool. Using a removable bandpass filter layer, rather than permanently installing a narrow bandpass filter in the aligner, does not affect the speed of patterning layers that do not require the enhanced resolution. The same aligner can thus be used for either high resolution or high throughput without substantial modification to the aligner.

REFERENCES:
patent: 4859063 (1989-08-01), Fay et al.
patent: 4950569 (1990-08-01), May
"Lithography's Leading Edge, Part 1: Phase-shift Technology,", P. Burggraaf, Semiconductor International, Feb. 1992, pp. 42-47.
"Lithography's Leading Edge, Part 2: I-line and Beyond," P. Burggraaf, Semiconductor International, Mar. 1992, pp. 52-56.

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