Refrigeration – Processes – Circulating external gas
Patent
1986-09-25
1987-09-15
Capossela, Ronald C.
Refrigeration
Processes
Circulating external gas
62 46, 62384, F25J 100
Patent
active
046937374
ABSTRACT:
A plurality of work stations may be cooled and temperature-controlled with subcooled liquid CO.sub.2 without a plurality of mechanical units for cooling CO.sub.2 and high capital costs resulting therefrom. The system includes a plurality of spaced-apart enclosures to be cooled, each enclosure having an associated tank containing subcooled liquid CO.sub.2 to be directed into the enclosure for cooling it and then to exhaust. The associated tanks are connected to a source of high pressure CO.sub.2 such as a large storage vessel which supplies CO.sub.2 for the associated tanks and for cooling the associated tanks as by expanding liquid CO.sub.2 in the vicinity of the associated tank. After expansion, CO.sub.2 vapor is directed to a reservoir or directly back to the storage vessel via a compressor. The reservoir contains CO.sub.2 slush and collects vapor CO.sub.2 used in the cooling process of a multiplicity of duplicate associated tanks, thus serving as a sink for the collection of CO.sub.2 vapor to be ultimately returned to the storage vessel.
REFERENCES:
patent: 2496185 (1950-01-01), Voss et al.
patent: 3660985 (1972-05-01), Tyree, Jr.
patent: 3754407 (1973-08-01), Tyree, Jr.
patent: 3810365 (1974-05-01), Hampton et al.
patent: 3933001 (1976-01-01), Tyree, Jr. et al.
patent: 4211085 (1980-07-01), Tyree, Jr.
The HT-300 Satellite CO.sub.2 Reservoir "Doing It Nature's Way"--Technical Bulletin by Hafstrom Technical Products, Inc.
Capossela Ronald C.
Liquid Carbonic Corporation
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