Remote center compliant flexure device

Details Remote center compliant flexure device Remote center compliant flexure device

2005-02-28

2008-10-07

Dougherty, Thomas M (Department: 2834)

Electrical generator or motor structure

Non-dynamoelectric

Piezoelectric elements and devices

C310S328000

Reexamination Certificate

active

07432634

ABSTRACT:
An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system to move about a plurality of axes. An actuation system is coupled to the flexure system to selectively constrain movement of the body along a subset of the plurality of axes.

REFERENCES:
patent: 3527062 (1970-09-01), Bilinski et al.
patent: 4098001 (1978-07-01), Watson
patent: 4155169 (1979-05-01), Drake et al.
patent: 4202107 (1980-05-01), Watson
patent: 4355469 (1982-10-01), Nevins et al.
patent: 4512848 (1985-04-01), Deckman et al.
patent: 4731155 (1988-03-01), Napoli et al.
patent: 4848179 (1989-07-01), Ubhayakar
patent: 4959252 (1990-09-01), Bonnebat et al.
patent: 5028366 (1991-07-01), Harakal et al.
patent: 5063321 (1991-11-01), Carter
patent: 5094533 (1992-03-01), Sawada et al.
patent: 5110514 (1992-05-01), Soane
patent: 5179863 (1993-01-01), Uchida et al.
patent: 5240550 (1993-08-01), Boehnke et al.
patent: 5259926 (1993-11-01), Kuwabara et al.
patent: 5270984 (1993-12-01), Mine
patent: 5355219 (1994-10-01), Araki et al.
patent: 5392123 (1995-02-01), Marcus et al.
patent: 5425848 (1995-06-01), Haisma et al.
patent: 5480047 (1996-01-01), Tanigawa et al.
patent: 5512131 (1996-04-01), Kumar et al.
patent: 5545367 (1996-08-01), Bae et al.
patent: 5601641 (1997-02-01), Stephens
patent: 5669303 (1997-09-01), Maracas et al.
patent: 5772905 (1998-06-01), Chou
patent: 5776748 (1998-07-01), Singhvi et al.
patent: 5820769 (1998-10-01), Chou
patent: 5849209 (1998-12-01), Kindt-Larsen et al.
patent: 5849222 (1998-12-01), Jen et al.
patent: 5888650 (1999-03-01), Calhoun et al.
patent: 5948470 (1999-09-01), Harrison et al.
patent: 5956216 (1999-09-01), Chou
patent: 5963315 (1999-10-01), Hiatt et al.
patent: 6046056 (2000-04-01), Parce et al.
patent: 6074827 (2000-06-01), Nelson et al.
patent: 6188150 (2001-02-01), Spence
patent: 6218316 (2001-04-01), Marsh
patent: 6274294 (2001-08-01), Hines
patent: 6309580 (2001-10-01), Chou
patent: 6326627 (2001-12-01), Putvinski et al.
patent: 6334960 (2002-01-01), Willson et al.
patent: 6348999 (2002-02-01), Summersgill et al.
patent: 6355198 (2002-03-01), Kim et al.
patent: 6391217 (2002-05-01), Schaffer et al.
patent: 6411010 (2002-06-01), Suzuki et al.
patent: 6449035 (2002-09-01), Batchelder
patent: 6467761 (2002-10-01), Amatucci et al.
patent: 6482742 (2002-11-01), Chou
patent: 6517977 (2003-02-01), Resnick et al.
patent: 6517995 (2003-02-01), Jacobson et al.
patent: 6518189 (2003-02-01), Chou
patent: 6580172 (2003-06-01), Mancini et al.
patent: 6646662 (2003-11-01), Nebashi et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6713238 (2004-03-01), Chou et al.
patent: 6776094 (2004-08-01), Whitesides et al.
patent: 6791669 (2004-09-01), Poon
patent: 6809356 (2004-10-01), Chou
patent: 6825437 (2004-11-01), Nakano et al.
patent: 6828244 (2004-12-01), Chou
patent: 6841048 (2005-01-01), Matt
patent: 6849558 (2005-02-01), Schaper
patent: 6870301 (2005-03-01), Choi et al.
patent: 6873087 (2005-03-01), Choi et al.
patent: 6900881 (2005-05-01), Sreenivasan et al.
patent: 6908861 (2005-06-01), Sreenivasan et al.
patent: 6916584 (2005-07-01), Sreenivasan et al.
patent: 6921615 (2005-07-01), Sreenivasan et al.
patent: 6922906 (2005-08-01), Choi et al.
patent: 6932934 (2005-08-01), Choi et al.
patent: 6946360 (2005-09-01), Chou
patent: 6955868 (2005-10-01), Choi et al.
patent: 6995499 (2006-02-01), Hwang
patent: 7024925 (2006-04-01), Gweon et al.
patent: 7060402 (2006-06-01), Choi et al.
patent: 7077992 (2006-07-01), Sreenivasan et al.
patent: 7098572 (2006-08-01), Choi et al.
patent: 7218032 (2007-05-01), Kim
patent: 7218035 (2007-05-01), Khajepour et al.
patent: 2002/0042027 (2002-04-01), Chou et al.
patent: 2002/0132482 (2002-09-01), Chou
patent: 2002/0167117 (2002-11-01), Chou
patent: 2003/0034329 (2003-02-01), Chou
patent: 2003/0062334 (2003-04-01), Lee et al.
patent: 2003/0080471 (2003-05-01), Chou
patent: 2003/0080472 (2003-05-01), Chou
patent: 2004/0036201 (2004-02-01), Chou et al.
patent: 2004/0046288 (2004-03-01), Chou
patent: 2004/0110856 (2004-06-01), Young et al.
patent: 2004/0118809 (2004-06-01), Chou et al.
patent: 2004/0131718 (2004-07-01), Chou et al.
patent: 2004/0137734 (2004-07-01), Chou et al.
patent: 2004/0149687 (2004-08-01), Choi et al.
patent: 2004/0156108 (2004-08-01), Chou et al.
patent: 2004/0192041 (2004-09-01), Jeong et al.
patent: 2004/0197843 (2004-10-01), Chou et al.
patent: 2004/0250945 (2004-12-01), Zheng et al.
patent: 2005/0037143 (2005-02-01), Chou et al.
patent: 2005/0264132 (2005-12-01), Choi et al.
patent: 2005/0275311 (2005-12-01), Choi et al.
patent: 2006/0062867 (2006-03-01), Choi et al.
patent: 2006/0076717 (2006-04-01), Sreenivasan et al.
patent: 2006/0077374 (2006-04-01), Sreenivasan et al.
patent: 2006/0203234 (2006-09-01), Gilton
patent: 2006/0266734 (2006-11-01), Fujii et al.
patent: 55-88332 (1980-07-01), None
patent: 57-7931 (1982-01-01), None
patent: 63-138730 (1988-06-01), None
patent: 63-194956 (1988-08-01), None
patent: 1-196749 (1989-08-01), None
patent: 02-24848 (1990-01-01), None
patent: 02-92603 (1990-04-01), None
patent: 02192045 (1990-07-01), None
patent: WO 87/02935 (1987-05-01), None
patent: WO 99/05724 (1999-02-01), None
patent: WO 00/21689 (2000-04-01), None
patent: WO 01/47003 (2001-06-01), None
Uchida et al., A Mask-to-Wafer Alignment and Gap Setting Method for X-ray Lithography Using Gratings, J. Vac. Sci. Technol. B 9 (6), pp. 3202-3206 Nov. 1, 1991.
Colburn et al., Step and Flash Imprint Lithography for sub-100 nm Patterning, Proceedings of SPIE vol. 3997, pp. 453-457 Jan. 1, 2000.
Chou et al., Imprint Lithography with 25-Nanometer Resolution, Science vol. 272, pp. 85-87 Apr. 5, 1996.
Heidari, Nanoimprint Lithography at the 6 in. Wafer Scale, J. Vac. Sci. Technol. B 18(6), pp. 3557-3560 Nov. 1, 2000.
Abstract of Japanese Patent 57-7931, Apr. 14, 2004.
Abstract of Japanese Patent 63-138730, Apr. 14, 2004.
Abstract of Japanese Patent 55-88332, Apr. 14, 2004.
Abstract of Japanese Patent 02-92603, Aug. 12, 2004.
Translation of Japanese Patent 02-92603, Apr. 3, 1990.
Translation of Japanese Patent 02-24848, Jan. 26, 1990.
Abstract of Japanese Patent 02-24848, Jan. 26, 1990.
Hiroshima et al., Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head, Japanese Journal of Applied Physics, vol. 43, No. 6B, pp. 4012-4016 Jun. 29, 2004.
Chou et al., Ultrafast and Direct Imprint of Nanostructures in Silicon, Nature, col. 417, (Jun. 2002), pp. 835-837 Jun. 1, 2002.
Chou et al., Nanoimprint Lithography, Journal of Vacuum Science Technolgoy B 14(16), pp. 4129-4133 Nov. 1, 1996.
Colburn et al., Development and Advantages of Step-and-Flash Lithography, Solid State Technology Jul. 1, 2001.
Colburn et al., Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers, Journal of Vacuum Science Technology. vol. b. 19(6) Nov. 1, 2001.
Bailey et al., Step and Flash Imprint Lithography: Defect Analysis, Journal of Vacuum Science, B 19(6), pp. 2806-2810 Nov. 1, 2001.
Bailey et al., Step and Flash Imprint Lithography: Template Surface Treatment and Defect Analysis, Journal of Vacuum Science, B 18(6), pp. 3572-3577 Nov. 1, 2000.
Schneider et al., Stripes of Partially Fluorinated Alkyl Chains: Dipolar Langmuir Monolayers, J. Chem. Phys. vol. 122, Issue 9 Mar. 1, 2005.
Colburn et al., Dissertation for the Degree of Doctor of Philosophy, Step and Flash Imprint Lithography: A Low-Pressure, Room-Temperature Nanoimprint Lithography Aug. 1, 2001.
U.S. Appl. No. 11/694,017, naming Inventors Jones et al., entitled Residual Layer Thickness Measurement and Correction, filed Mar. 30, 2007.
U.S. Appl. No. 11/737,301, naming Inventors Schumaker, entitled Method for Detecting a Particle in a Nanoimprint Lithography System, filed Apr. 19, 2007.
Shao et al., Near-Field Enhanced, Mold-Assisted, Parallel Direct Nanostructuring of a Gold Thin Film on Glass, Applied Physics Letters, vo

Affiliated with

Also associated with

Rating

Remote center compliant flexure device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Remote center compliant flexure device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Remote center compliant flexure device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4013779