Remediation process and apparatus

Organic compounds -- part of the class 532-570 series – Organic compounds – Oxygen containing

Reexamination Certificate

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Details

C568S867000, C095S160000, C095S162000

Reexamination Certificate

active

08049044

ABSTRACT:
The invention relates to a process for remediation of a fluid contaminated with alkylene oxide, involving contacting the contaminated fluid with an aqueous absorbent to yield a fat absorbent having absorbed fluid, conferring intimate contact of fat absorbent and alkylene oxide and conversion of alkylene oxide; and, an apparatus for remediation of the fluid which has a converter having inlet means connected to the outlet of a fluid absorber for contacting fluid and aqueous absorbent, a holding unit having a volume V for the fat absorbent, and outlet means connected to the inlet of a fluid desorber.

REFERENCES:
patent: 3867113 (1975-02-01), Foster et al.
patent: 4397660 (1983-08-01), Van der Pas-Toornstra
patent: 4508927 (1985-04-01), Bhise et al.
patent: 4831196 (1989-05-01), Buonicore et al.
patent: 5106458 (1992-04-01), Meyer et al.
patent: 5763691 (1998-06-01), Kawabe et al.
patent: 198 43 721 (1998-09-01), None
patent: 776890 (1997-06-01), None
patent: 498119 (1939-01-01), None
patent: WO 84/00748 (1984-03-01), None
International Search Report, dated Apr. 23, 2004.
PCT International Preliminary Examination Report, International Application No. PCT/EP 03/51095 filed Dec. 23. 2003.

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